German Future Award goes to Jena
This year, the Federal President's Award for Technology and Innovation - the German Future Prize - goes to an innovation called "EUV Lithography". This novel process for the production of microchips was developed at the research site in Jena. The outstanding achievement was accomplished by a team of researchers of the Fraunhofer Institute for Applied Optics and Precision Engineering (IOF) in cooperation with the companies Zeiss (Oberkochen) and Trumpf (Ditzingen). The award was presented by Federal President Frank Walter Steinmeier on 25 November.
Science Minister Wolfgang Tiefensee congratulated the entire team of developers on winning the prize and was pleased that the foundation for this future-oriented development was laid in Thuringia. The award is a clear signal for the excellent scientific work performed in Thuringia. It is the third time the Fraunhofer-IOF in Jena receives the German Future Prize.
EUV Lithography enables the production of microelectronic components that are not only much smaller but also more energy-efficient and significantly more powerful than conventional microchips. This way, structures can be generated that are only a few nanometres in size and thus make the integration of more than a billion transistors possible on the surface of a fingertip.
The IOF in Jena has been supported by the state since 1992 as part of its institutional research and project funding.
The award winners introduce themselves: to the YouTube Video